Title :
Optical characteristics of UV-LED with subwavelength grating
Author :
Takashima, Youichi ; Haraguchi, Ryo Shimizu Masanobu ; Naoi, Yoshiki
Author_Institution :
Univ. of Tokushima, Tokushima, Japan
Abstract :
Subwavelength grating structure with a thickness of 150 nm was fabricated on ultraviolet light emitting diode by using electron beam lithography and inductively coupled plasma (ICP) etching. For an optimal designed period, the subwavelength grating exhibit high polarization selectivity for the wavelength from 365 nm to 400 nm. Especially, a polarization ratio (TE/TM) of 3.5 was achieved for 365 nm. Applying this characteristics, we demonstrated highly polarized UV-LED.
Keywords :
diffraction gratings; electron beam lithography; etching; light emitting diodes; optical design techniques; optical fabrication; plasma materials processing; electron beam lithography; high polarization selectivity; inductively coupled plasma etching; optical characteristics; optical design; optical fabrication; polarization ratio; polarized UV-LED; size 150 nm; subwavelength grating structure; ultraviolet light emitting diode; wavelength 365 nm to 400 nm; Electron beams; Etching; Films; Finite difference methods; Gratings; Light emitting diodes; Time-domain analysis;
Conference_Titel :
Microoptics Conference (MOC), 2013 18th
Conference_Location :
Tokyo
