• DocumentCode
    675582
  • Title

    UTBB FDSOI scaling enablers for the 10nm node

  • Author

    Grenouillet, L. ; Liu, Quanwei ; Wacquez, R. ; Morin, P. ; Loubet, N. ; Cooper, Daniel ; Pofelski, A. ; Weng, Wen-Yin ; Bauman, F. ; Gribelyuk, M. ; Wang, Yannan ; De Salvo, B. ; Gimbert, J. ; Cheng, K. ; Le Tiec, Y. ; Chanemougame, D. ; Augendre, E. ; Ma

  • Author_Institution
    CEA-LETI, Albany, NY, USA
  • fYear
    2013
  • fDate
    7-10 Oct. 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    UTBB FDSOI technology is a faster, cooler and simpler technology addressing the performance/energy consumption trade-off. In this paper we present the main front-end-of-the-line knobs to scale down this promising technology to the 10nm node.
  • Keywords
    field effect transistors; low-power electronics; silicon-on-insulator; UTBB FDSOI technology; performance-energy consumption trade-off; scaling enablers; size 10 nm; Capacitance; Delays; Logic gates; Performance evaluation; Silicon; Strain; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2013 IEEE
  • Conference_Location
    Monterey, CA
  • Type

    conf

  • DOI
    10.1109/S3S.2013.6716546
  • Filename
    6716546