DocumentCode :
676064
Title :
Crosstalk analysis of through silicon vias with low pitch-to-diameter ratio in 3D-IC
Author :
Sheng Liu ; Jianping Zhu ; Yongrong Shi ; Xing Hu ; Wanchun Tang
Author_Institution :
Sch. of Electron. & Opt. Eng., Nanjing Univ. of Sci. & Technol., Nanjing, China
Volume :
02
fYear :
2013
fDate :
23-25 Oct. 2013
Firstpage :
1001
Lastpage :
1004
Abstract :
An equivalent circuit model for low pitch-to-diameter ratio (P/D) through silicon via (TSV) in three-dimensional integrated circuit (3-D IC) is proposed in this paper. The shunt admittance of this model is calculated based on the method of moments which can accurately capture the proximity effect for both a TSV pair and TSV array. The metal-oxide-semiconductor (MOS) capacitance of TSV is also considered. With this model, the crosstalk of TSV array can be fully analyzed regardless of the pitch. The results by this model agree well with those by the electromagnetic simulations up to 40GHz.
Keywords :
MOS capacitors; crosstalk; equivalent circuits; method of moments; three-dimensional integrated circuits; 3D-IC; MOS capacitance; TSV array; TSV pair; crosstalk analysis; electromagnetic simulations; equivalent circuit model; low pitch-to-diameter ratio; metal-oxide-semiconductor capacitance; method of moments; proximity effect; shunt admittance; through silicon vias; Arrays; Capacitance; Crosstalk; Integrated circuit modeling; Silicon; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Antennas & Propagation (ISAP), 2013 Proceedings of the International Symposium on
Conference_Location :
Nanjing
Print_ISBN :
978-7-5641-4279-7
Type :
conf
Filename :
6717661
Link To Document :
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