DocumentCode
677287
Title
Light optimal design for machine vision based on reflection
Author
Guangming Gao ; Xiaojun Wu
Author_Institution
Shenzhen Key Lab. for AMC&MAE, Harbin Inst. of Technol., Shenzhen, China
fYear
2013
fDate
26-28 Aug. 2013
Firstpage
185
Lastpage
190
Abstract
Illumination is one of the most important elements to capture high quality images in machine vision systems, which can guarantee the efficiency and robustness of the applications. Contrary to the experience based trail and error convention to select a light system, a optimization model for LED illumination system design is proposed based on the surface reflection characteristics, e.g. the roughness, the index of surface reflectivity, direction, etc, to maximize the contrast between the features of interest and the background. The optimization model applies to a wide range of materials. And it can be used to get the optimal parameters which make the contrast between target and background be biggest, such as incidence angle, wavelength and intensity of light. Through experiments and simulations, our proposed scheme can achieve high quality images with biggest contrast, which would be an efficient methodology for optimal LED light system design in machine vision to simplify the algorithm.
Keywords
computer vision; light emitting diodes; light reflection; lighting; LED illumination system design; contrast; high quality images; incidence angle; light intensity; machine vision systems; optimal LED light system design; optimization model; surface reflection characteristics; wavelength; Attenuation; Computational modeling; Light emitting diodes; Lighting; Machine vision; Materials; Optimization;
fLanguage
English
Publisher
ieee
Conference_Titel
Information and Automation (ICIA), 2013 IEEE International Conference on
Conference_Location
Yinchuan
Type
conf
DOI
10.1109/ICInfA.2013.6720293
Filename
6720293
Link To Document