DocumentCode :
677287
Title :
Light optimal design for machine vision based on reflection
Author :
Guangming Gao ; Xiaojun Wu
Author_Institution :
Shenzhen Key Lab. for AMC&MAE, Harbin Inst. of Technol., Shenzhen, China
fYear :
2013
fDate :
26-28 Aug. 2013
Firstpage :
185
Lastpage :
190
Abstract :
Illumination is one of the most important elements to capture high quality images in machine vision systems, which can guarantee the efficiency and robustness of the applications. Contrary to the experience based trail and error convention to select a light system, a optimization model for LED illumination system design is proposed based on the surface reflection characteristics, e.g. the roughness, the index of surface reflectivity, direction, etc, to maximize the contrast between the features of interest and the background. The optimization model applies to a wide range of materials. And it can be used to get the optimal parameters which make the contrast between target and background be biggest, such as incidence angle, wavelength and intensity of light. Through experiments and simulations, our proposed scheme can achieve high quality images with biggest contrast, which would be an efficient methodology for optimal LED light system design in machine vision to simplify the algorithm.
Keywords :
computer vision; light emitting diodes; light reflection; lighting; LED illumination system design; contrast; high quality images; incidence angle; light intensity; machine vision systems; optimal LED light system design; optimization model; surface reflection characteristics; wavelength; Attenuation; Computational modeling; Light emitting diodes; Lighting; Machine vision; Materials; Optimization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Information and Automation (ICIA), 2013 IEEE International Conference on
Conference_Location :
Yinchuan
Type :
conf
DOI :
10.1109/ICInfA.2013.6720293
Filename :
6720293
Link To Document :
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