DocumentCode
677767
Title
A novel simulation methodology for modeling cluster tools
Author
Cimren, Emrah ; Havey, Robert ; Dongjin Kim
Author_Institution
Micron Technol. Inc., Manassas, VA, USA
fYear
2013
fDate
8-11 Dec. 2013
Firstpage
3866
Lastpage
3878
Abstract
Cluster tools are highly integrated machines that can perform multiple manufacturing processes. A series of processing steps, transportation, and control are integrated into a single tool. We develop a novel simulation methodology to determine production schedules for cluster tools. The proposed approach provides route of products in the tool with given process times and scheduling rules. Framework and algorithms used in the simulation are presented. Based on the methodology, we develop a simulation model for a scanner cluster tool used in the photolithography process in semiconductor manufacturing. The impact of different input factors on the tool throughput and cycle time is investigated.
Keywords
cluster tools; digital simulation; photolithography; production control; production engineering computing; semiconductor device manufacture; cluster tools modeling; highly integrated machines; multiple manufacturing processes; photolithography process; process times; production schedules; scanner cluster tool; scheduling rules; semiconductor manufacturing; simulation methodology; Analytical models; Dynamic scheduling; Heuristic algorithms; Mathematical model; Object oriented modeling; Schedules; Transportation;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation Conference (WSC), 2013 Winter
Conference_Location
Washington, DC
Print_ISBN
978-1-4799-2077-8
Type
conf
DOI
10.1109/WSC.2013.6721746
Filename
6721746
Link To Document