Title :
A novel simulation methodology for modeling cluster tools
Author :
Cimren, Emrah ; Havey, Robert ; Dongjin Kim
Author_Institution :
Micron Technol. Inc., Manassas, VA, USA
Abstract :
Cluster tools are highly integrated machines that can perform multiple manufacturing processes. A series of processing steps, transportation, and control are integrated into a single tool. We develop a novel simulation methodology to determine production schedules for cluster tools. The proposed approach provides route of products in the tool with given process times and scheduling rules. Framework and algorithms used in the simulation are presented. Based on the methodology, we develop a simulation model for a scanner cluster tool used in the photolithography process in semiconductor manufacturing. The impact of different input factors on the tool throughput and cycle time is investigated.
Keywords :
cluster tools; digital simulation; photolithography; production control; production engineering computing; semiconductor device manufacture; cluster tools modeling; highly integrated machines; multiple manufacturing processes; photolithography process; process times; production schedules; scanner cluster tool; scheduling rules; semiconductor manufacturing; simulation methodology; Analytical models; Dynamic scheduling; Heuristic algorithms; Mathematical model; Object oriented modeling; Schedules; Transportation;
Conference_Titel :
Simulation Conference (WSC), 2013 Winter
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4799-2077-8
DOI :
10.1109/WSC.2013.6721746