• DocumentCode
    677767
  • Title

    A novel simulation methodology for modeling cluster tools

  • Author

    Cimren, Emrah ; Havey, Robert ; Dongjin Kim

  • Author_Institution
    Micron Technol. Inc., Manassas, VA, USA
  • fYear
    2013
  • fDate
    8-11 Dec. 2013
  • Firstpage
    3866
  • Lastpage
    3878
  • Abstract
    Cluster tools are highly integrated machines that can perform multiple manufacturing processes. A series of processing steps, transportation, and control are integrated into a single tool. We develop a novel simulation methodology to determine production schedules for cluster tools. The proposed approach provides route of products in the tool with given process times and scheduling rules. Framework and algorithms used in the simulation are presented. Based on the methodology, we develop a simulation model for a scanner cluster tool used in the photolithography process in semiconductor manufacturing. The impact of different input factors on the tool throughput and cycle time is investigated.
  • Keywords
    cluster tools; digital simulation; photolithography; production control; production engineering computing; semiconductor device manufacture; cluster tools modeling; highly integrated machines; multiple manufacturing processes; photolithography process; process times; production schedules; scanner cluster tool; scheduling rules; semiconductor manufacturing; simulation methodology; Analytical models; Dynamic scheduling; Heuristic algorithms; Mathematical model; Object oriented modeling; Schedules; Transportation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation Conference (WSC), 2013 Winter
  • Conference_Location
    Washington, DC
  • Print_ISBN
    978-1-4799-2077-8
  • Type

    conf

  • DOI
    10.1109/WSC.2013.6721746
  • Filename
    6721746