Title :
Low temperature low ppm acetone detection by Pd/TiO2/p-Si Metal-Insulator-Semiconductor devices
Author :
Hazra, A. ; Bhowmik, B. ; Dutta, K. ; Bhattacharyya, P.
Author_Institution :
Dept. of Electron. & Telecommun. Eng., Bengal Eng. & Sci. Univ., Howrah, India
Abstract :
In this present investigation nanocrystalline TiO2 based sensor was developed for low ppm level (10-100) acetone detection. TiO2 thin film (Thickness: 1 μm) was prepared by solgel technique and deposited on the p-Si substrate (5 Ωcm, (100)) by dip coating method. Film was annealed at 450°C for 3 hours in air environment. XRD and FESEM study confirmed the (101) anatase growth with ~6-9 nm particle size. Pd electrode was deposited on the TiO2 sensing layer to prepare the Pd/TiO2/p-Si Metal-Insulator-Semiconductor (MIS) device structure. A detailed acetone sensor study was performed for this MIS device in the temperature range of 100 to 200°C. Sensor showed a repeatable sensing performance with a appreciably fast response time of 7.7 s at 100°C towards 10 ppm acetone with corresponding recovery time of 13 s at 200°C in 10 ppm acetone. Response magnitude was increased from 3.2% to 6.4% with increasing the acetone concentration from 10 to 100 ppm at 200°C.
Keywords :
MIS devices; X-ray diffraction; annealing; chemical sensors; dip coating; field emission electron microscopy; nanosensors; organic compounds; palladium; particle size; scanning electron microscopy; sol-gel processing; titanium compounds; FESEM; Pd electrode; Pd-TiO2-Si; Si; XRD; air environment; annealing; dip coating method; fast response time; low temperature low ppm acetone detection; metal-insulator-semiconductor devices; nanocrystalline TiO2 based sensor; p-Si substrate; particle size; sol-gel technique; temperature 100 degC to 200 degC; temperature 450 degC; time 3 hour; Actuators; Electrodes; Temperature distribution; Temperature sensors; Time factors; Acetone sensing; MIS device; Nanocrystalline TiO2; low temperature;
Conference_Titel :
Sensing Technology (ICST), 2013 Seventh International Conference on
Conference_Location :
Wellington
Print_ISBN :
978-1-4673-5220-8
DOI :
10.1109/ICSensT.2013.6727683