Title :
New method for measuring the different region thermal resistance of AlGaAs/GaAs HEMTs in a large temperature range
Author :
Zhang Jianwei ; Feng Shiwei ; Zhu Hui ; Wei Guanghua ; Wu Yanyan
Author_Institution :
Coll. of Electron. Inf. & Control Eng., Beijing Univ. of Technol., Beijing, China
Abstract :
The thermal resistance of different region in the AlGaAs/GaAs HEMTs is measured in a large temperature range by the pulsed switching electrical method. The thermal resistance of the chip solders and base can be measured, respectively, through the cooling response curve processed by the structure method. As the temperature increases, the total thermal resistance increases by 50% from -20°C to 150°C. And the increase of chip thermal resistance is about 67.2% of the total increased thermal resistance. It can be attributed to the decrease of the chip heat conductivity and the enhancement of phonons collisions. The result is significant for the thermal design and the reliability design of HEMTs.
Keywords :
III-V semiconductors; aluminium compounds; cooling; gallium arsenide; high electron mobility transistors; phonons; semiconductor device reliability; solders; temperature measurement; thermal conductivity measurement; thermal resistance measurement; AlGaAs-GaAs; HEMT; chip heat conductivity; chip solder; cooling response curve processing; phonon collision enhancement; pulsed switching electrical method; reliability design; temperature -20 degC to 150 degC; temperature measurement; thermal resistance measurement; Educational institutions; Electrical resistance measurement; HEMTs; MODFETs; Temperature measurement; Thermal resistance; high electron mobility transistor; large temperature range; structure function; thermal resistance;
Conference_Titel :
Electronic Measurement & Instruments (ICEMI), 2013 IEEE 11th International Conference on
Conference_Location :
Harbin
Print_ISBN :
978-1-4799-0757-1
DOI :
10.1109/ICEMI.2013.6743006