DocumentCode
682189
Title
Research on the calibration technique of on-wafer load-pull system
Author
Luan Peng ; Liang Faguo ; Han Zhiguo ; Li Jingqiang ; Qiao Yu´e
Author_Institution
Hebei Semicond. Res. Inst., Shijiazhuang, China
Volume
1
fYear
2013
fDate
16-19 Aug. 2013
Firstpage
436
Lastpage
440
Abstract
By using load-pull technique, non-linear device behavior can be obtained through changing the source impedance or load impedance. Load-pull system is so complex that there is no effective way for its performance metrology, which results in significant variance of device parameter, such as power, gain, and PAE. This paper discusses in-situ calibration of on-wafer load-pull system and provides the verified result. The technique mentioned in this paper can calibrate the performance of the on-wafer load-pull system reliably and roundly, and give the measurement uncertainty of the system. Thus the calibration scheme is more reasonable, while the measurement result is more reliable.
Keywords
calibration; measurement uncertainty; calibration; load impedance; measurement uncertainty; nonlinear device behavior; on-wafer load-pull system; source impedance; Calibration; Impedance; Measurement uncertainty; Scattering parameters; Semiconductor device measurement; Standards; Uncertainty; calibration; load-pull; on-wafer; transfer standards;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Measurement & Instruments (ICEMI), 2013 IEEE 11th International Conference on
Conference_Location
Harbin
Print_ISBN
978-1-4799-0757-1
Type
conf
DOI
10.1109/ICEMI.2013.6743023
Filename
6743023
Link To Document