• DocumentCode
    682189
  • Title

    Research on the calibration technique of on-wafer load-pull system

  • Author

    Luan Peng ; Liang Faguo ; Han Zhiguo ; Li Jingqiang ; Qiao Yu´e

  • Author_Institution
    Hebei Semicond. Res. Inst., Shijiazhuang, China
  • Volume
    1
  • fYear
    2013
  • fDate
    16-19 Aug. 2013
  • Firstpage
    436
  • Lastpage
    440
  • Abstract
    By using load-pull technique, non-linear device behavior can be obtained through changing the source impedance or load impedance. Load-pull system is so complex that there is no effective way for its performance metrology, which results in significant variance of device parameter, such as power, gain, and PAE. This paper discusses in-situ calibration of on-wafer load-pull system and provides the verified result. The technique mentioned in this paper can calibrate the performance of the on-wafer load-pull system reliably and roundly, and give the measurement uncertainty of the system. Thus the calibration scheme is more reasonable, while the measurement result is more reliable.
  • Keywords
    calibration; measurement uncertainty; calibration; load impedance; measurement uncertainty; nonlinear device behavior; on-wafer load-pull system; source impedance; Calibration; Impedance; Measurement uncertainty; Scattering parameters; Semiconductor device measurement; Standards; Uncertainty; calibration; load-pull; on-wafer; transfer standards;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Measurement & Instruments (ICEMI), 2013 IEEE 11th International Conference on
  • Conference_Location
    Harbin
  • Print_ISBN
    978-1-4799-0757-1
  • Type

    conf

  • DOI
    10.1109/ICEMI.2013.6743023
  • Filename
    6743023