Effects of surface roughness on aluminum local back surface field silicon wafer solar cells

Author

Yu-Hsuan Lin ; Sung-Yu Chen ; Chen-Hsun Du ; Shih-Peng Hsu ; Bing-Cyun Chen ; Der-Chin Wu

Author_Institution

Green Energy & Environ. Res. Lab. (GEL), Ind. Technol. Res. Inst. (ITRI), Hsinchu, Taiwan

fYear

2013

fDate

16-21 June 2013

Firstpage

2227

Lastpage

2229

Abstract

Screen-printed aluminum local back surface field (Al-LBSF) solar cells are a promising candidate for high-efficiency industrial silicon-based solar cells. For improving the conversion efficiency, industrial LBSF cell process flows typically comprise rear side planarization to reduce the surface roughness. In this paper, we investigate the influences of rear surface topographies on wet chemical polishing LBSF cells. The best conversion efficiency of 19.09% on screen-printed LBSF cell with polished rear surface was demonstrated.

Keywords

aluminium; elemental semiconductors; planarisation; polishing; silicon; solar cells; surface roughness; thick films; aluminum local back surface field silicon wafer solar cells; conversion efficiency; rear side planarization; rear surface topography; screen printing; surface roughness; wet chemical polishing; Optical surface waves; Photovoltaic cells; Rough surfaces; Silicon; Surface roughness; Surface topography; Surface treatment; aluminium oxide; local back surface field; passivation; silicon solar cell; surface roughness;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th

Conference_Location

Tampa, FL

Type

conf

DOI

10.1109/PVSC.2013.6744919

Filename

6744919