Title :
Electrochemical assembly and molecular dynamics simulation of SAM on copper for epoxy/copper adhesion improvement
Author :
Kwok, Stephen C. T. ; Yuen, M.M.F.
Author_Institution :
Dept. of Mech. & Aerosp. Eng, Hong Kong Univ. of Sci. & Technol., Hong Kong, China
Abstract :
This work reports on adhesion enhancement effects of self-assembled organothiol treatment on copper (Cu)/epoxy interface, as well as a significant reduction in treatment time under the influence of electric potential. The interfacial adhesion has 20-fold enhancement through the treatment due to improved linkage between copper substrate and epoxy layer by chemisorbed organothiol molecules. The treatment time was greatly reduced by a factor 32 from 16 hours to 30 minutes thanks to the electrical field assisted method without compromising the maximum adhesion strength, which was shown to be in order of 97.2Jm-2. Molecular Dynamics (MD) simulations were also carried out for studying the surface coverage effect of Self-assembly Monolayer (SAM) on Cu surface towards adhesion strength between Cuiepoxy interface. Simulation results together with experimental data were then used for explaining the adhesion promotion mechanism between Cu/epoxy interface.
Keywords :
adhesion; chemisorption; copper; electrochemistry; monolayers; moulding; resins; self-assembly; Cu; SAM; adhesion enhancement effect; chemisorbed organothiol molecules; electric potential; electrochemical assembly; epoxy-copper adhesion improvement; interfacial adhesion; maximum adhesion strength; molecular dynamics simulations; self-assembled monolayer; self-assembled organothiol treatment; surface coverage effect; Adhesive strength; Adhesives; Copper; Electrodes; Substrates; Surface impedance; Surface treatment;
Conference_Titel :
Electronics Packaging Technology Conference (EPTC 2013), 2013 IEEE 15th
Conference_Location :
Singapore
Print_ISBN :
978-1-4799-2832-3
DOI :
10.1109/EPTC.2013.6745759