DocumentCode :
68820
Title :
Fabrication of Self-Packaged Seamless Nanoporous SU-8 Microchannels
Author :
Sheng-Po Fang ; Pit Fee Jao ; Kun Cho ; Jung Hae Yoon ; Kyoung-Tae Kim ; Yong-Kyu Yoon
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainesville, FL, USA
Volume :
24
Issue :
2
fYear :
2015
fDate :
Apr-15
Firstpage :
256
Lastpage :
258
Abstract :
Fabrication of a self-packaged partial semicircular nanoporous microchannel is demonstrated using electrospinning, self-limiting ultraviolet lithography, and thermal-reHow packaging processes with SU-8. The fabrication process offers unique advantages of microresolution channel patterning, alignment free seamless integration of nanofibers in a microchannel by self-packaged reHow, and easy formation of 3-D nanoporous channels. A fabricated nanoporous microchannel with a channel length of 7 mm, a channel width of 73.85 μm, and a channel height of 34.65 μm shows slow Huidic How through the channel, functioning as an effective nanochannel with an equivalent channel height of 800 nm and a radius of 857 nm, and therefore, its reduction ratios of the channel height and radius are ~97.7% and 97.8%, respectively.
Keywords :
electrospinning; microchannel flow; nanofabrication; nanofluidics; nanolithography; nanoporous materials; photoresists; ultraviolet lithography; electrospinning; nanoporous channels; self-limiting ultraviolet lithography; self-packaged partial semicircular nanoporous microchannel; self-packaged seamless nanoporous SU-8; thermal-reflow packaging processes; Gravity; Liquids; Lithography; Microchannels; Nanoscale devices; Optical device fabrication; Nanofluidic; alignment-free; lithography; nanoporous microchannels; nanoporous microchannels.; seamless integration; self-packaging;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2015.2396472
Filename :
7042813
Link To Document :
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