• DocumentCode
    688704
  • Title

    Chemically etched ultra-high-Q resonators

  • Author

    Hansuek Lee ; Tong Chen ; Jiang Li ; Ki Youl Yang ; Vahala, Kerry

  • Author_Institution
    Lab. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
  • fYear
    2013
  • fDate
    9-14 June 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Using a wet etch process, optical resonators with quality factor as high as 875 million are demonstrated. These silicon-chip-based devices are fabricated without reflow, thereby expanding the range of integration opportunities and possible applications.
  • Keywords
    Q-factor; etching; optical fabrication; optical resonators; Si; chemical etching; optical resonators; quality factor; silicon-chip-based devices; ultrahigh-Q resonators; wet etching; Dispersion; Microcavities; Optical buffering; Q-factor; Silicon; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2013 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6833079
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=688704