Title :
Chemically etched ultra-high-Q resonators
Author :
Hansuek Lee ; Tong Chen ; Jiang Li ; Ki Youl Yang ; Vahala, Kerry
Author_Institution :
Lab. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
Abstract :
Using a wet etch process, optical resonators with quality factor as high as 875 million are demonstrated. These silicon-chip-based devices are fabricated without reflow, thereby expanding the range of integration opportunities and possible applications.
Keywords :
Q-factor; etching; optical fabrication; optical resonators; Si; chemical etching; optical resonators; quality factor; silicon-chip-based devices; ultrahigh-Q resonators; wet etching; Dispersion; Microcavities; Optical buffering; Q-factor; Silicon; Silicon compounds;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location :
San Jose, CA
