DocumentCode :
688708
Title :
CMOS-compatible titanium dioxide deposition for athermalization of silicon photonic waveguides
Author :
Kuanping Shang ; Djordjevic, Stevan S. ; Jun Li ; Ling Liao ; Basak, Juthika ; Hai-Feng Liu ; Yoo, S.J.B.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of California, Davis, Davis, CA, USA
fYear :
2013
fDate :
9-14 June 2013
Firstpage :
1
Lastpage :
2
Abstract :
We discuss titanium dioxide material development for CMOS compatible fabrication and integration of athermal silicon photonic components. Titanium dioxide overclad ring modulators achieved athermal operation (<; 0.2 GHz/°C).
Keywords :
CMOS integrated circuits; elemental semiconductors; integrated optics; integrated optoelectronics; optical fabrication; optical modulation; optical waveguides; silicon; titanium compounds; CMOS-compatible titanium dioxide deposition; TiO2-Si; athermalization; overclad ring modulators; silicon photonic waveguides; titanium dioxide material development; Optical device fabrication; Optical films; Optical ring resonators; Optical waveguides; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
6833083
Link To Document :
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