DocumentCode :
688733
Title :
Laser annealing and simulation of a:Si thin films for solar cell applications
Author :
Theodorakos, Y. ; Kalpyris, I. ; Kotsovos, K. ; Sarigiannidis, C. ; Vamvakas, V. ; Tsoukalas, D. ; Raptis, Y.S. ; Zergioti, I.
Author_Institution :
Phys. Dept., Nat. Tech. Univ. of Athens, Athens, Greece
fYear :
2013
fDate :
9-14 June 2013
Firstpage :
1
Lastpage :
2
Abstract :
Laser annealing experiments for the crystallization of amorphous silicon layer and improvement of its solar cell efficiency are presented here. Temperature simulation to define the depth profile distribution was also performed.
Keywords :
amorphous semiconductors; crystallisation; elemental semiconductors; laser beam annealing; semiconductor thin films; silicon; solar cells; thin film devices; Si; amorphous silicon layer; amorphous silicon thin films; crystallization; depth profile distribution; laser annealing; solar cell applications; solar cell efficiency; temperature simulation; Absorption; Amorphous silicon; Annealing; Crystallization; Lasers; Simulated annealing; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
6833108
Link To Document :
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