• DocumentCode
    688733
  • Title

    Laser annealing and simulation of a:Si thin films for solar cell applications

  • Author

    Theodorakos, Y. ; Kalpyris, I. ; Kotsovos, K. ; Sarigiannidis, C. ; Vamvakas, V. ; Tsoukalas, D. ; Raptis, Y.S. ; Zergioti, I.

  • Author_Institution
    Phys. Dept., Nat. Tech. Univ. of Athens, Athens, Greece
  • fYear
    2013
  • fDate
    9-14 June 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Laser annealing experiments for the crystallization of amorphous silicon layer and improvement of its solar cell efficiency are presented here. Temperature simulation to define the depth profile distribution was also performed.
  • Keywords
    amorphous semiconductors; crystallisation; elemental semiconductors; laser beam annealing; semiconductor thin films; silicon; solar cells; thin film devices; Si; amorphous silicon layer; amorphous silicon thin films; crystallization; depth profile distribution; laser annealing; solar cell applications; solar cell efficiency; temperature simulation; Absorption; Amorphous silicon; Annealing; Crystallization; Lasers; Simulated annealing; Temperature distribution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2013 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6833108