DocumentCode :
68908
Title :
Stability of Silicon Microelectromechanical Systems Resonant Thermometers
Author :
Ng, Eldwin Jiaqiang ; Hyung Kyu Lee ; Chae Hyuck Ahn ; Melamud, R. ; Kenny, Thomas W.
Author_Institution :
Dept. of Mech. Eng., Stanford, CA, USA
Volume :
13
Issue :
3
fYear :
2013
fDate :
Mar-13
Firstpage :
987
Lastpage :
993
Abstract :
The frequency stability of single-crystal silicon microelectromechanical systems resonators encapsulated with epitaxial polysilicon (epi-seal) is investigated. As silicon resonators have significant temperature dependence, the inherent frequency stability of the resonators is masked by temperature-induced noise. Using two resonators side-by-side and assuming identical temperatures and fluctuations, temperature effects are eliminated, resulting in the two resonators tracking each other within ±10 ppb, or 3 × 10-4 °C, over a month. Power and thermal cycling the resonators produced no observable effects on the resonant frequency. This result indicates that silicon resonators make excellent on-chip thermometers, or high stability timing references if temperature is compensated well.
Keywords :
elemental semiconductors; frequency stability; micromechanical resonators; microsensors; silicon; thermometers; epitaxial polysilicon; inherent frequency stability; single-crystal silicon microelectromechanical systems resonators; temperature dependence; temperature-induced noise; thermal cycling; thermometers; Circuit stability; Frequency measurement; Resonant frequency; Silicon; Temperature measurement; Temperature sensors; Thermal stability; Micromechanical resonators; silicon; stability; thermometer;
fLanguage :
English
Journal_Title :
Sensors Journal, IEEE
Publisher :
ieee
ISSN :
1530-437X
Type :
jour
DOI :
10.1109/JSEN.2012.2227708
Filename :
6353884
Link To Document :
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