DocumentCode :
689523
Title :
Toward an efficient germanium-on-silicon laser: Ultimate limits of tensile strain and n-type doping
Author :
Sukhdeo, David S. ; Donguk Nam ; Ze Yuan ; Dutt, Birendra Raj ; Saraswat, Krishna C.
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
fYear :
2013
fDate :
9-14 June 2013
Firstpage :
1
Lastpage :
2
Abstract :
We investigate the ultimate limits of tensile strain and n-type doping for improving germanium lasers. These ultimate limits occur around 2.3-3.7% biaxial strain and 1018-1019 cm-3 electrically-active doping. >1000x threshold reductions are possible.
Keywords :
elemental semiconductors; germanium; semiconductor doping; semiconductor lasers; biaxial strain; electrically-active doping; germanium-on-silicon laser; n-type doping; tensile strain; Doping; Laser theory; Mirrors; Silicon; Tensile strain;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
6833909
Link To Document :
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