Title :
Development of a coherent EUV scatterometry microscope
Author :
Kinoshita, Hiroyuki ; Harada, Tatsuya ; Nagata, Yuichi ; Watanabe, Toshio ; Midorikawa, Katsumi
Author_Institution :
Center for EUV Lithography, Univ. of Hyogo, Kamigori, Japan
Abstract :
EUV coherent scatterometry microscopy (CSM) systems has been developed. The CSM system employs a high-order harmonic generation (HHG) 13.5 nm coherent source to detect pattern defects and measure the CD of patterns. The resolution of pattern defects and repeatability of CD measurement are 20 nm and 0.1 nm, respectively.
Keywords :
light coherence; optical harmonic generation; optical microscopy; CD measurement; CSM system; EUV coherent scatterometry microscopy systems; HHG; coherent source; high-order harmonic generation; pattern defect detection; pattern defect resolution; wavelength 13.5 nm; Diffraction; Inspection; Microscopy; Radar measurements; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location :
San Jose, CA
