DocumentCode :
69061
Title :
Demonstration of Multiple Substrate Reuses for Inverted Metamorphic Solar Cells
Author :
Adams, J. ; Elarde, V. ; Hains, Alexander ; Stender, Christopher ; Tuminello, F. ; Youtsey, C. ; Wibowo, A. ; Osowski, M.
Author_Institution :
MicroLink Devices, Inc., Niles, IL, USA
Volume :
3
Issue :
2
fYear :
2013
fDate :
Apr-13
Firstpage :
899
Lastpage :
903
Abstract :
The substrate typically accounts for more than 50% of the bill of materials cost for a III-V solar cell wafer. A substantial fraction of this cost can be mitigated via multiple reuses of the substrate. We report on inverted metamorphic (IMM) solar cells grown on GaAs substrates that have undergone up to five consecutive reuse cycles. The active solar cell layers are removed from the substrate after each growth cycle via epitaxial lift-off, which is a nondestructive selective etch process, and the substrate is then repolished in preparation for reuse. The solar cell wafer is transferred to a temporary carrier for processing using standard photolithographic techniques. Data from five reuse cycles demonstrate that the use of repolished substrates does not compromise the performance of IMM solar cells.
Keywords :
III-V semiconductors; etching; gallium arsenide; photolithography; polishing; solar cells; substrates; GaAs; GaAs substrates; III-V solar cell wafer; IMM solar cells; active solar cell layers; epitaxial lift-off; inverted metamorphic solar cells; multiple substrate reuses; nondestructive selective etch process; repolished substrates; standard photolithographic techniques; Epitaxial growth; Epitaxial layers; Gallium arsenide; Photovoltaic cells; Photovoltaic systems; Standards; Substrates; Epitaxial lift-off; III-V; inverted metamorphic solar cell; photovoltaics; substrate reuse;
fLanguage :
English
Journal_Title :
Photovoltaics, IEEE Journal of
Publisher :
ieee
ISSN :
2156-3381
Type :
jour
DOI :
10.1109/JPHOTOV.2013.2245722
Filename :
6470620
Link To Document :
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