DocumentCode :
692160
Title :
Investigation of intermediate dielectric for dual floating gate MOSFET
Author :
Sarkar, B. ; Jayanti, Srikant ; Di Spigna, Neil ; Bongmook Lee ; Misra, Vishal ; Franzon, P.
Author_Institution :
Dept. of Electr. Eng., North Carolina State Univ., Raleigh, NC, USA
fYear :
2013
fDate :
12-14 Aug. 2013
Firstpage :
1
Lastpage :
4
Abstract :
A dual floating gate transistor offers potential as a unified memory, with simultaneous volatile and non-volatile storage. The quality of the dielectric between the two floating gates is critical to achieving the required dynamic cycle endurance. This paper reports on the results of early experiments into the material choice and process for this dielectric.
Keywords :
DRAM chips; MOSFET; dielectric materials; DRAM; dual floating gate MOSFET; dual floating gate memory; dynamic cycle endurance; intermediate dielectric; Dielectrics; Flash memories; Hafnium compounds; Logic gates; MOS capacitors; Nonvolatile memory; Transistors; DRAM; EOT; MIM; endurance; flash memory; floating gate; retention;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Memory Technology Symposium (NVMTS), 2013 13th
Conference_Location :
Minneapolis, MN
Type :
conf
DOI :
10.1109/NVMTS.2013.6851052
Filename :
6851052
Link To Document :
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