Title :
Structural enhancement of ZnO thin films by sol-gel process for photonic applications
Author :
Kumar, Sudhakar ; Kapoor, Ajay ; Singh, Fouran
Author_Institution :
Dept. of Electron. Sci., Univ. of Delhi, New Delhi, India
Abstract :
Zinc oxide (ZnO) thin film is grown on glass substrate by the sol-gel spin coating technique. The prepared film annealed at 450 °C. X-ray diffraction shows that the ZnO Film is polycrystalline with (002) preferential orientation. We have found the Surface roughness was minimum (12.4 nm) by atomic force microscopy. The optical band gap is found to be 3.12±0.01 eV by UV-visible Spectroscopy. The Wave guiding properties of the thin film has been also studied. The results indicate that our film is monomode at 632.8 nm with propagation optical loss estimated around 1.6 dB/cm.
Keywords :
II-VI semiconductors; X-ray diffraction; annealing; atomic force microscopy; optical constants; optical losses; semiconductor growth; semiconductor thin films; sol-gel processing; spin coating; surface roughness; texture; ultraviolet spectra; visible spectra; wide band gap semiconductors; zinc compounds; (002) preferential orientation; SiO2; UV-visible spectroscopy; ZnO; atomic force microscopy; glass substrate; monomode film; optical band gap; photonic applications; polycrystalline film; propagation optical loss; sol-gel spin coating technique; structural enhancement; surface roughness; temperature 450 degC; thin films; wave guiding properties; Annealing; Atomic measurements; Films; Microprocessors; TV; Atomic force microscopy; UV-Visible Spectroscopy; ZnO thin Film;
Conference_Titel :
Recent Advances in Photonics (WRAP), 2013 Workshop on
Conference_Location :
New Delhi
Print_ISBN :
978-1-4799-4864-2
DOI :
10.1109/WRAP.2013.6917684
