DocumentCode
69714
Title
Ballistic Transport Performance of Silicane and Germanane Transistors
Author
Kain Lu Low ; Wen Huang ; Yee-Chia Yeo ; Gengchiau Liang
Author_Institution
Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore, Singapore, Singapore
Volume
61
Issue
5
fYear
2014
fDate
May-14
Firstpage
1590
Lastpage
1598
Abstract
The ballistic transport performance of field-effect transistor (FET) based on hydrogenated silicene and germanene, i.e., silicane and germanane, respectively, is examined. The electronic band structures of silicane and germanane are investigated using the first-principles density functional theory. Subsequently, the ballistic performance of FETs is evaluated via the semiclassical ballistic transport model. We find that silicane n-MOSFET offers a relatively better ON-current performance than transistors made of germanane and 2-D transition metal dichalcogenides (2-D-TMDs) (MoS2, MoSe2, WS2, and WSe2). Germanane n-MOSFET suffers from the issue of low density of states due to its smaller electron effective mass. P-FETs based on germanane and silicane have higher ON-current than those of 2-D-TMDs p-FETs. Further investigation on other aspects of silicane and germanane MOSFETs, such as gate leakage and contact resistance, is needed to comprehensively assess their overall performance metrics.
Keywords
ballistic transport; contact resistance; density functional theory; field effect transistors; semiconductor device models; 2D transition metal dichalcogenides; contact resistance; density functional theory; electronic band structures; field effect transistor; gate leakage; germanane n-MOSFET; semiclassical ballistic transport model; silicane n-MOSFET; Ballistic transport; Effective mass; MOSFET; Materials; Performance evaluation; Photonic band gap; Ballistic transport; germanane; hydrogenated silicene and germanane; silicane; silicane.;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2014.2313065
Filename
6784483
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