DocumentCode
702320
Title
Technology/circuit co-optimization and benchmarking for graphene interconnects at Sub-10nm technology node
Author
Chenyun Pan ; Raghavan, Praveen ; Catthoor, Francky ; Tokei, Zsolt ; Naeemi, Azad
Author_Institution
Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2015
fDate
2-4 March 2015
Firstpage
599
Lastpage
603
Abstract
In this paper, graphene interconnects are analyzed based on realistic circuits in terms of multiple material properties, such as the mean free path, the contact resistance, and the edge roughness. The benchmark against conventional copper wires shows that the advantage of graphene usage occurs only under certain circumstances. The device-level parameters, including the supply and threshold voltages, and the circuit-level parameters, including the wire length and width, have large impacts on both the delay and energy-delay product (EDP) comparisons. Two representative circuits, a 32-bit adder and an SRAM, are investigated. Up to 40% and 70% of the improvement in delay and EDP are observed for a 32-bit adder. For the SRAM application, contact resistance is a crucial factor in dictating the performance of graphene interconnects.
Keywords
SRAM chips; adders; circuit optimisation; contact resistance; copper; graphene devices; integrated circuit interconnections; SRAM; adder; circuit cooptimization; circuit-level parameters; contact resistance; copper wires; device-level parameters; energy-delay product; graphene interconnects; storage capacity 32 bit; threshold voltages; wire length; wire width; Capacitance; Copper; Delays; Graphene; Integrated circuit interconnections; Resistance; Wires; 32-bit adder; Multi-layer graphene interconnect; SRAM; circuit-level simulation; delay; energy-delay product; performance;
fLanguage
English
Publisher
ieee
Conference_Titel
Quality Electronic Design (ISQED), 2015 16th International Symposium on
Conference_Location
Santa Clara, CA
Print_ISBN
978-1-4799-7580-8
Type
conf
DOI
10.1109/ISQED.2015.7085495
Filename
7085495
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