• DocumentCode
    704612
  • Title

    Device bias technique to improve design metrics of 6T SRAM cell for subthreshold operation

  • Author

    Pal, Soumitra ; Islam, Aminul

  • Author_Institution
    Birla Inst. of Technol., Electron. & Commun. Eng., Ranchi, India
  • fYear
    2015
  • fDate
    19-20 Feb. 2015
  • Firstpage
    865
  • Lastpage
    870
  • Abstract
    At present day SRAM cell is under renewal stage. Researchers are aiming to get an SRAM cell which is reliable and robust against process, voltage and temperature (PVT) fluctuations. An SRAM cell is also expected to support low-power applications. This article proposes a new way for designing an SRAM cell. The proposed cell functions properly even bellow subthreshold region. Therefore, it can be useful for ultralow-power applications. Robustness/reliability of the proposed design is investigated by estimating read static noise margin (RSNM). The estimated results are compared with its conventional counterpart. The proposed 6T SRAM cell offers 1.83× faster read operation. It is also less affected by PVT fluctuations (by 1.47×) during read operation compared to conventional 6T SRAM cell. The proposed SRAM cell exhibits 1.40× higher RSNM compared to conventional 6T SRAM cell, proving its reliability during read operation. It also shows 3.86% faster write operation. It is 18.4% less affected by PVT fluctuations. It has 2.33% higher write static noise margin (WSNM) than the conventional 6T SRAM cell.
  • Keywords
    SRAM chips; low-power electronics; semiconductor device reliability; 6T SRAM cell; PVT; RSNM; WSNM; device bias technique; process voltage and temperature; read static noise margin; subthreshold operation; ultralow-power applications; write static noise margin; Delays; Fluctuations; Robustness; SRAM cells; Threshold voltage; Transistors; CMOS; DTMOS mechanism; Read Delay; Read Stability; Write Delay; Write-Ability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Signal Processing and Integrated Networks (SPIN), 2015 2nd International Conference on
  • Conference_Location
    Noida
  • Print_ISBN
    978-1-4799-5990-7
  • Type

    conf

  • DOI
    10.1109/SPIN.2015.7095170
  • Filename
    7095170