Low-Ohmic Resistance Comparison: Measurement Capabilities and Resistor Traveling Behavior

Author

Rietveld, Gert ; van der Beek, J.H.N. ; Kraft, Michael ; Elmquist, Randolph E. ; Mortara, Alessandro ; Jeckelmann, Beat

Author_Institution

Van Swinden Lab., Nat. Metrol. Inst. of The Netherlands, Delft, Netherlands

Volume

62

Issue

6

fYear

2013

fDate

Jun-13

Firstpage

1723

Lastpage

1728

Abstract

The low-ohmic resistance measurement capabilities of the Van Swinden Laboratorium, National Institute of Standards and Technology, and the Federal Office of Metrology (METAS) were compared using a set of resistors with values 100 mΩ, 10 mΩ, 1 mΩ, and 100 μΩ, respectively. The measurement results of the three laboratories agree extremely well within the respective measurement uncertainties with the comparison reference value. Careful transport of the resistors was crucial for achieving this result. Still, some of the resistors showed steps in value at each transport which likely relates to the construction of the resistance elements of these resistors.

Keywords

electric resistance measurement; measurement uncertainty; resistors; low ohmic resistance measurement; measurement uncertainty; resistor traveling behavior; Current measurement; Electrical resistance measurement; Laboratories; NIST; Resistance; Resistors; Temperature measurement; Comparison; low-ohmic measurements; precision measurements; resistance measurements; resistors; shunts; traveling behavior;

fLanguage

English

Journal_Title

Instrumentation and Measurement, IEEE Transactions on

Publisher

ieee

ISSN

0018-9456

Type

jour

DOI

10.1109/TIM.2012.2225917

Filename

6355669