Title :
NBTI-induced circuit aging optimization by protectability-aware gate replacement technique
Author :
Guimao Zhang ; Maoxiang Yi ; Yong Miao ; Dawen Xu ; Huaguo Liang
Author_Institution :
Sch. of Electron. Sci. & Appl. Phys, Hefei Univ. of Technol., Hefei, China
Abstract :
Circuit aging induced by the negative bias temperature instability (NBTI) has become a major factor of reliability. The NBTI-induced aging of a logic gate can be mitigated by gate replacement technique only when the input gates of a logic gate are of some specific types. A protectability-aware gate replacement technique is proposed in this paper to mitigate NBTI-induced circuit aging. In the proposed technique the critical gates are identified by considering the impact of the types of input gates on their protectability, guaranteeing all the critical gates can be protected from static NBTI fatigue. Experimental results on ISCAS85 benchmark circuits under 45nm transistor model show that, compared with the techniques that neglect the impact of input gates´ type, the proposed scheme has up to more than 4, 7 and 10 times, on average, improvement on NBTI-induced delay degradation under timing margin 5%, 10% and 15%.
Keywords :
MOSFET; ageing; circuit optimisation; circuit reliability; logic gates; negative bias temperature instability; semiconductor device models; ISCAS85 benchmark circuits; NBTI-induced circuit aging optimization; NBTI-induced delay degradation; logic gate; negative bias temperature instability; protectability-aware gate replacement technique; size 45 nm; static NBTI fatigue; transistor model; Aging; Benchmark testing; Degradation; Delays; Integrated circuit modeling; Logic gates; Negative bias temperature instability; critical gates; gate replacement; protectability;
Conference_Titel :
Test Symposium (LATS), 2015 16th Latin-American
Conference_Location :
Puerto Vallarta
DOI :
10.1109/LATW.2015.7102502