DocumentCode :
709112
Title :
A tunable Marchand balun at K band in silicon germanium (SiGe) technology
Author :
Boglione, Luciano ; Goodman, Joel
Author_Institution :
Naval Res. Lab., Washington, DC, USA
fYear :
2015
fDate :
16-18 March 2015
Firstpage :
292
Lastpage :
295
Abstract :
This paper presents the design of a switch-based, tunable Marchand balun at K band. The tunability is achieved by using pass gate CMOS structures that ideally switch in or out sections of the balun, thereby controlling its frequency response. The balun is fabricated in a high performance SiGe BiCMOS process with standard 180 nm CMOS technology. The ability to tune the response across a frequency range is demonstrated. The balun is characterized in terms of mixed signal scattering parameters. Extensive layout and simulations have been executed. The authors believe this is the first demonstration of a tunable balun using pass gate structures to change the lengths of the balun windings in the high region of the microwave range.
Keywords :
BiCMOS integrated circuits; CMOS integrated circuits; Ge-Si alloys; baluns; bipolar MMIC; circuit tuning; field effect MMIC; frequency response; semiconductor materials; BiCMOS process; K band; SiGe; Silicon Germanium technology; balun windings; frequency response; mixed signal scattering parameters; pass gate CMOS structures; size 180 nm; switch-based tunable Marchand balun; Bandwidth; Impedance matching; Logic gates; Microwave circuits; Ports (Computers); Silicon germanium; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference (GeMiC), 2015 German
Conference_Location :
Nuremberg
Type :
conf
DOI :
10.1109/GEMIC.2015.7107811
Filename :
7107811
Link To Document :
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