Transfer properties of moth-eye structure film by RTR UV-NIL

Anti-reflection (AR) film is very useful for prevention of light reflection on FPDs and solar-cell panel. In particular, AR structure (moth-eye structure) film has high performance on prevention from light reflection. Our previous study reported that anti-reflection structure was fabricated by oxygen ion beam irradiation to glassy carbon (GC) . In this study, we focused on the transfer properties of AR structure film by roll to roll UV nano-imprint lithography (RTR UV-NIL) with replica mold. To obtain the two types of replica molds, two types of photo-curable resin (PARQIT OEX-028-X433-3, Autex Co., Ltd and PAK-01-CL; Toyo Gosei Co. Ltd., Tokyo) were used. These replica molds were fabricated from the GC master mold which was irradiated by oxygen ion beam. We examined the feed speed dependence on RTR UV-NIL using two types replica molds. In addition, we examined the durability of replica mold at the optimum feed speed for transferred AR structure film. As a result, we were able to produce high-performance AR film at a feed speed of 6.0 m/min and we also confirmed no change of transferred film up to 200 imprint times.