Title :
Enhancement mode gallium nitride transistor reliability
Author :
Lidow, Alex ; Strittmatter, Rob ; Chunhua Zhou ; Yanping Ma
Author_Institution :
Efficient Power Conversion Corp., El Segundo, CA, USA
Abstract :
Reliability testing of GaN transistors continues to accumulate with positive results. In this paper, we build upon previous studies [1-7], providing new reliability data on commercially available enhancement mode GaN transistors under a wide variety of stress conditions. The first section reports data on long-term, large sample size qualification testing under high temperature reverse bias (HTRB) and high temperature gate bias (HTGB). Environmental reliability data is also shown, including temperature cycling and humidity. The second section provides failure rate predictions using acceleration factors derived by stressing devices outside of normal gate and drain voltage stress conditions. In the last section, we discuss the reliability advantages of wafer level chipscale (WLCS) packaging compared to conventional MOSFET packages.
Keywords :
III-V semiconductors; chip scale packaging; field effect transistors; gallium compounds; semiconductor device reliability; semiconductor device testing; wafer level packaging; GaN; HTGB; HTRB; WLCS packaging; acceleration factors; commercially available enhancement mode GaN transistors; drain voltage stress conditions; environmental reliability data; failure rate predictions; high temperature gate bias; high temperature reverse bias; long-term large sample size qualification testing; reliability testing; temperature cycling; wafer level chipscale packaging; Field effect transistors; Gallium nitride; Logic gates; Reliability; Stress; Testing; GaN; HTGB; HTRB; Reliability; eGaN FETs; failure rate prediction; packaging;
Conference_Titel :
Reliability Physics Symposium (IRPS), 2015 IEEE International
Conference_Location :
Monterey, CA
DOI :
10.1109/IRPS.2015.7112686