DocumentCode :
709838
Title :
Understanding pulsed-cycling variability and endurance in HfOx RRAM
Author :
Balatti, S. ; Ambrogio, S. ; Wang, Z.-Q. ; Sills, S. ; Calderoni, A. ; Ramaswamy, N. ; Ielmini, D.
Author_Institution :
DEIB, Politec. di Milano, Milan, Italy
fYear :
2015
fDate :
19-23 April 2015
Abstract :
Resistive switching memory (RRAM) devices based on metal oxides are receiving strong interest for future high-density stand-alone memories and storage class memories. To explore possible applications of RRAM, the set/reset variability and cycling endurance must be addressed and understood. This work shows a comprehensive study of pulsed-operated variability and endurance in HfOx-RRAM. We analysed the dependence of switching variability on operation current, voltage and pulse-width, providing guidelines to optimize set/reset distributions in oxide RRAM. The impact of pulse-amplitude and pulse-width on cycling endurance is then discussed. The results are explained by a new physics-based model for endurance controlled by defect injection from the bottom electrode during reset.
Keywords :
hafnium compounds; high-k dielectric thin films; resistive RAM; HfOx; bottom electrode; cycling endurance; defect injection; high-density stand-alone memory; metal oxides; physics-based model; pulse-amplitude; pulse-width; pulsed-cycling variability; resistive switching memory devices; set-reset distributions; set-reset variability; storage class memory; Current measurement; Degradation; Electrical resistance measurement; Integrated circuits; Resistance; Switches; Voltage measurement; Resistive switching memory (RRAM); cycling; endurance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2015 IEEE International
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/IRPS.2015.7112744
Filename :
7112744
Link To Document :
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