DocumentCode :
709839
Title :
A microscopic physical description of RTN current fluctuations in HfOx RRAM
Author :
Puglisi, Francesco Maria ; Pavan, Paolo ; Vandelli, Luca ; Padovani, Andrea ; Bertocchi, Matteo ; Larcher, Luca
Author_Institution :
Dipt. di Ing. “Enzo Ferrari”, Univ. di Modena e Reggio Emilia, Modena, Italy
fYear :
2015
fDate :
19-23 April 2015
Abstract :
In this work we explore the microscopic mechanisms responsible for Random Telegraph Noise (RTN) current fluctuations in HfOx Resistive Random Access Memory (RRAM) devices. The statistical properties of the RTN current fluctuations are analyzed in a variety of reading conditions by exploiting the Factorial Hidden Markov Model (FHMM) to decompose the complex RTN traces in a superimposition of two-level fluctuations. We investigate the physical mechanisms that could be responsible for the RTN current fluctuations by considering two options that are the Coulomb blockade effect and the metastable-to-stable transition of defect assisting the Trap-Assisted-Tunneling (TAT) charge transport. Physics-based simulations show that both options allow reproducing the RTN current fluctuations. The electron TAT via oxygen vacancy defects, responsible for the current in High Resistive State (HRS), is significantly altered by the electric field caused by electron trapping at defects (i.e. neutral interstitial oxygen), not directly involved in charge transport. Similarly, the transition of oxygen vacancies into a stable-slow defect configuration (still unidentified in HfOx) can temporarily switch off the current, thus explaining the RTN.
Keywords :
electron traps; hafnium compounds; hidden Markov models; integrated circuit noise; random noise; resistive RAM; Coulomb blockade effect; FHMM; HfOx; RTN current fluctuations; TAT charge transport; charge transport; complex RTN traces; electron TAT; electron trapping; factorial hidden Markov model; metastable-to-stable transition; microscopic physical description; neutral interstitial oxygen; oxygen vacancy defects; oxygen vacancy transition; physics-based simulations; random telegraph noise; reading conditions; resistive random access memory devices; stable-slow defect configuration; statistical properties; trap-assisted-tunneling charge transport; two-level fluctuation superimposition; Dielectrics; Electron traps; Fluctuations; Hafnium compounds; Kinetic theory; Switches; Interstitial Oxygen; Meta-stable States; Oxygen Vacancy; RRAM; RTN; Reliability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2015 IEEE International
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/IRPS.2015.7112746
Filename :
7112746
Link To Document :
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