• DocumentCode
    709855
  • Title

    A fWLR test structure and method for device reliability monitoring using product relevant circuits

  • Author

    Vollertsen, R.-P. ; Georgakos, G. ; Kolpin, K. ; Olk, C.

  • Author_Institution
    Reliability Monitoring, Infineon Technol. AG, Neubiberg, Germany
  • fYear
    2015
  • fDate
    19-23 April 2015
  • Abstract
    The measurement of device degradation in product relevant circuits during production monitoring is described. Ring oscillators with local on-chip heaters are introduced for quick characterization of the voltage and temperature dependence and for fast wafer level reliability (fWLR) monitoring. The suitability of the structures, the equipment and the stress/measurement algorithm is demonstrated. Results for optimizing the stress and readout conditions are shown as well as the relation to standard device stress measurements. The dominating degradation mechanism in this work turned out to be NBTI (negative bias temperature instability).
  • Keywords
    circuit reliability; circuit testing; negative bias temperature instability; oscillators; NBTI; device degradation; device reliability monitoring; device stress measurements; fWLR test structure; fast wafer level reliability monitoring; negative bias temperature instability; on-chip heaters; product relevant circuits; production monitoring; readout conditions; ring oscillators; Degradation; Monitoring; Ring oscillators; Semiconductor device reliability; Stress; Temperature measurement; NBTI; device degradation; fWLR; reliability; ring oscillator; technology monitoring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2015 IEEE International
  • Conference_Location
    Monterey, CA
  • Type

    conf

  • DOI
    10.1109/IRPS.2015.7112781
  • Filename
    7112781