DocumentCode
711008
Title
High-performance fully transparent Ti-Zn-O thin film transistors
Author
Nannan Zhao ; Dedong Han ; Zhuofa Chen ; Jing Wu ; Yingying Cong ; Junchen Dong ; Feilong Zhao ; Shengdong Zhang ; Xing Zhang ; Yi Wang
Author_Institution
Shenzhen Grad. Sch., Peking Univ., Shenzhen, China
fYear
2015
fDate
27-29 April 2015
Firstpage
1
Lastpage
2
Abstract
Since the report [1] in 2004 on transparent and flexible thin film transistors (TFTs) using amorphous In-Ga-Zn-O (IGZO), an increasing number of companies [2] have taken part into developing this type of TFTs and have demonstrated various flat panel displays (FPDs), including e-papers, organic light-emitting diodes (OLEDs) and liquid crystal displays (LCDs). Undeniably, IGZO TFTs exhibit excellent performances in various aspects, such as high mobility, comparably good stability and mature fabrication process [3-4]. However, In element is a toxicant element, which is harmful to human body. What´s worse, the storage of both In and Ga element is very limited, leading to their high price. This is very detrimental to industrial production. So we need to develop some new materials.
Keywords
II-VI semiconductors; flat panel displays; gallium; indium; thin film transistors; titanium compounds; wide band gap semiconductors; zinc compounds; FPD; In-Ga-Zn-O; LCD; OLED; TFT; TiZnO; e-papers; fabrication process; flat panel displays; high mobility aspects; high-performance fully transparent-flexible thin film transistors; human body; industrial production; liquid crystal displays; organic light-emitting diodes; stability; toxicant element; Atmosphere; Films; Fluid flow; Logic gates; Performance evaluation; Thin film transistors; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems and Application (VLSI-TSA), 2015 International Symposium on
Conference_Location
Hsinchu
Type
conf
DOI
10.1109/VLSI-TSA.2015.7117554
Filename
7117554
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