Title :
100 V class multiple stepped oxide field plate trench MOSFET (MSO-FP-MOSFET) aimed to ultimate structure realization
Author :
Kobayashi, Kenya ; Nishiguchi, Toshifumi ; Katoh, Shunsuke ; Kawano, Takahiro ; Kawaguchi, Yusuke
Author_Institution :
Adv. Discrete Dev. Center, Toshiba Corp., Ishikawa, Japan
Abstract :
For low-voltage power MOSFETs technology, Field Plate (FP) and Superjunction (SJ) structures have been applied to reduce on-resistance drastically. As one of the approach for the ultimate structure realization, we propose a multiple stepped oxide FP-MOSFET (MSO-FP-MOSFET) that is extremely close to ideal gradient oxide structure. We have validated an optimum device structure by TCAD simulation and achieved lowest on-resistance of 28.5 mΩmm2 at breakdown voltage of 115.2 V. This performance indicates 25 % improvement compared to conventional devices. Moreover, to demonstrate the MSO-FP-MOSFET characteristics for the first time, we present some measurement data of TEG samples.
Keywords :
MOSFET; low-power electronics; semiconductor device breakdown; semiconductor junctions; MSO-FP-MOSFET; TCAD simulation; breakdown voltage; low-voltage power MOSFET technology; lowest on-resistance; multiple stepped oxide field plate trench; optimum device structure; superjunction structures; ultimate structure realization; voltage 100 V; voltage 115.2 V; Electric fields; Electric potential; Electrodes; Etching; Fabrication; Logic gates; MOSFET;
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2015 IEEE 27th International Symposium on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4799-6259-4
DOI :
10.1109/ISPSD.2015.7123409