DocumentCode :
71308
Title :
Determining Drain Current Characteristics and Channel Temperature Rise in GaN HEMTs
Author :
Yamin Zhang ; Shiwei Feng ; Hui Zhu ; Xueqin Gong ; Lei Shi ; Chunsheng Guo
Author_Institution :
Lab. of Semicond. Device Reliability Phys., Beijing Univ. of Technol., Beijing, China
Volume :
14
Issue :
4
fYear :
2014
fDate :
Dec. 2014
Firstpage :
978
Lastpage :
982
Abstract :
We experimentally investigated how self-heating affected the transient response of drain current in AlGaN/GaN high-electron-mobility transistors. Since drain current depends on temperature, we measured the drain current to assess the transient temperature rise of the active area. Based on the transient temperature rise, we used the structure function method to analyze the resistance to temperature rise. This can be used to extract the chip temperature rise even for a packaged device. We verified the proposed electrical method by comparing its results to those measured by the forward-Schottky-junction-characteristic method, revealing good agreement.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; transient response; wide band gap semiconductors; AlGaN-GaN; HEMTs; channel temperature rise; chip temperature rise extraction; drain current characteristics; forward-Schottky-junction-characteristic method; high-electron-mobility transistors; packaged device; self-heating; structure function method; transient response; transient temperature rise; Aluminum gallium nitride; Current measurement; Gallium nitride; HEMTs; MODFETs; Temperature measurement; Transient analysis; AlGaN/GaN HEMTs; drain current transient response; reliability; self-heating; transient temperature rise measurement;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2014.2356233
Filename :
6899601
Link To Document :
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