DocumentCode :
71466
Title :
Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography
Author :
Okayama, Hideaki ; Shimura, Daisuke ; Onawa, Yosuke ; Takahashi, Hiroki ; Seki, Morihiro ; Koshino, Keiji ; Yokoyama, Naoki ; Oshtsuka, M. ; Tsuchizawa, Tai ; Nishi, Hidetaka ; Yamada, Koji ; Yaegashi, Hiroki ; Horikawa, Tsuyoshi ; Sasaki, Hiromu
Author_Institution :
Institute for Photonics-Electronics Convergence System Technology (PECST) and Photonics Electronics Technology Research Association (PETRA), Japan
Volume :
49
Issue :
22
fYear :
2013
fDate :
Oct. 24 2013
Firstpage :
1401
Lastpage :
1402
Abstract :
A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion. An improved crosstalk of -23 dB was obtained.
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2013.2979
Filename :
6649535
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=71466
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