Various Shapes of Plasma Spokes Observed in HiPIMS

Author

Hecimovic, Ante ; von Keudell, Achim ; Schulz-von der Gathen, Volker ; Winter, Jessica

Author_Institution

Dept. of Exp. Phys. II, Ruhr-Univ. Bochum, Bochum, Germany

Volume

42

Issue

10

fYear

2014

fDate

Oct. 2014

Firstpage

2810

Lastpage

2811

Abstract

A time-resolved analysis of the emission of power impulse magnetron sputtering plasmas reveals inhomogeneities in the form of rotating spokes. The shape of these spokes depends on the target material in a characteristic manner; the peculiar shape of the emission profiles is explained by the localization of the sputtering process as being governed by Ar gas rarefaction and the local dynamics of secondary electrons generation. This general picture is able to explain the observed emission patterns for different target materials as presented.

Keywords

argon; plasma diagnostics; plasma materials processing; secondary electron emission; sputtering; Ar; Ar gas rarefaction; HiPIMS; emission profiles; high-power impulse magnetron sputtering plasmas; plasma spokes; rotating spokes; secondary electron generation; sputtering process; time-resolved analysis; Argon; Discharges (electric); Ionization; Plasmas; Shape; Sputtering; Plasma diagnostic; plasma measurements; plasma waves; plasma waves.;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2014.2330454

Filename

6844894