DocumentCode :
715941
Title :
Parametric excitation in geometrically optimized AlN contour mode resonators
Author :
Ruochen Lu ; Anming Gao ; Songbin Gong
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA
fYear :
2015
fDate :
12-16 April 2015
Firstpage :
1
Lastpage :
4
Abstract :
This work reports the first observation of parametric excitation in geometrically optimized Aluminum Nitride (AlN) contour mode resonators (CMRs). The concept of parametric excited AlN CMRs harnesses the fact that the resonant frequencies of extensional mode vibrations along transverse and longitudinal directions can both be determined by resonator dimensions. Therefore, by geometrically optimizing lateral dimensions, dual resonances can be engineered at f0 and 2f0 respectively for inputting parametric excitation and outputting fundamental oscillations. In operation, the parametric excitation amplifies an orthogonal oscillation at f0 by periodically modulating the stiffness constants of AlN piezoelectric thin film via straining the structure. The experimental results have shown quality factor (Q) enhancement from 50 ot 2708 for a parametrically excited resonance. Upon further scaling and optimizations, it is anticipated that this type of devices will lead to the development of GHz low noise frequency sources and nano-electro-mechanical logic.
Keywords :
III-V semiconductors; aluminium compounds; crystal oscillators; optimisation; parametric oscillators; piezoelectric thin films; wide band gap semiconductors; AlN; CMR; aluminum nitride; extensional mode vibration; geometrically optimized contour mode resonator; inputting parametric excitation; low noise frequency source; nanoelectromechanical logic; optimization; outputting fundamental oscillation; piezoelectric thin film; quality factor; Admittance; Aluminum nitride; Electrodes; III-V semiconductor materials; Oscillators; Resonant frequency; Vibrations; aluminum nitride; contour mode resonators; parametric excitation; quality factor enhancement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control Symposium & the European Frequency and Time Forum (FCS), 2015 Joint Conference of the IEEE International
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4799-8865-5
Type :
conf
DOI :
10.1109/FCS.2015.7138781
Filename :
7138781
Link To Document :
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