Nanoscale resistive Ni-Ti films obtained by magnetron sputtering

Author

Vasilev, V.A. ; Khoshev, A.V.

Author_Institution

Dept. of Instrum. Eng., Penza State Univ., Penza, Russia

fYear

2015

fDate

21-23 May 2015

Firstpage

1

Lastpage

4

Abstract

The paper considers the application of the method of magnetron sputtering from two sources for the controlled synthesis of nanoscale resistive Ni-Ti films. A description of the technological process of nanoscale Ni-Ti films production is given. Conditions for the films´ receipt with high specific electrical surface resistivity and low temperature coefficient of resistance were defined. The research materials can serve as the basis for developing new resistive elements of measuring instruments (pressure, force, acceleration sensors, etc.) with improved technical characteristics, operating in conditions of high temperatures.

Keywords

electrical resistivity; metallic thin films; nanostructured materials; nickel alloys; sputter deposition; surface resistance; titanium alloys; Ni-Ti; electrical surface resistivity; high temperatures; magnetron sputtering; nanoscale resistive films; technological process; temperature coefficient of resistance; Magnetic cores; Magnetic films; Nanoscale devices; Nickel; Sputtering; Temperature sensors; N&MEMS; Ni-Ti; magnetron sputtering; thin film;

fLanguage

English

Publisher

ieee

Conference_Titel

Control and Communications (SIBCON), 2015 International Siberian Conference on

Conference_Location

Omsk

Print_ISBN

978-1-4799-7102-2

Type

conf

DOI

10.1109/SIBCON.2015.7147013

Filename

7147013