DocumentCode
718891
Title
Parylene C autofluorescence for on-chip highest processing temperature sensing
Author
Lingqian Zhang ; Yaoping Liu ; Fang Yang ; Wei Wang ; Dacheng Zhang ; Zhihong Li
Author_Institution
Inst. of Microelectron., Peking Univ., Beijing, China
fYear
2015
fDate
7-11 April 2015
Firstpage
302
Lastpage
305
Abstract
This paper reported an on-chip sensing method to record the highest processing temperature that the structure experienced by using the autofluorescence of Parylene C. Temperature properties of Parylene C autofluorescence was studied, that with the increment of processing temperature, the fluorescence intensity kept increasing. Therefore, the Parylene C was deposited on the chip as a temperature indicating label to sensing the highest temperature in a plasma etching process. Test results showed that the heating effect of 5min to 25min plasma etching was successfully presented by the Parylene C autofluorescence. As the deposition process of Parylene C was conformal and fabrication compatible, this method was promising to achieve temperature sensing on micron and submicron scaled structure.
Keywords
fluorescence; optical sensors; sputter deposition; sputter etching; temperature measurement; temperature sensors; deposition process; fluorescence intensity; heating effect; micron scaled structure; on-chip temperature sensing method; parylene C autofluorescence; plasma etching process; submicron scaled structure; time 5 min to 25 min; Etching; Fluorescence; Plasma temperature; Temperature; Temperature measurement; Temperature sensors; Parylene C; fluorescence; temperature sensing;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2015 IEEE 10th International Conference on
Conference_Location
Xi´an
Type
conf
DOI
10.1109/NEMS.2015.7147431
Filename
7147431
Link To Document