Title :
A Global Enhanced Vibrational Kinetic Model for High-Pressure Hydrogen RF Discharges
Author :
Averkin, Sergey N. ; Gatsonis, Nikolaos A. ; Olson, Lynn
Author_Institution :
Dept. of Mech. Eng., Worcester Polytech. Inst., Worcester, MA, USA
Abstract :
A global enhanced vibrational kinetic model (GEVKM) is developed for multitemperature, chemically reacting hydrogen plasmas in inductively coupled cylindrical discharges for lowto high-pressure regimes. The species in a GEVKM are ground-state hydrogen atoms H and molecules H2, 14 vibrationally excited hydrogen molecules H2(v), v = 1 - 14, electronically excited hydrogen atoms H(2) and H(3), groundstate positive ions H+, H2+, and H3+, ground-state negative ions H-, and electrons e. The GEVKM involves volume-averaged steady-state continuity equations for the plasma species, an electron energy equation, a total energy equation, a heat transfer equation to the chamber walls, and a comprehensive set of surface and volumetric chemical processes governing vibrational and ionization kinetics of hydrogen plasmas. The GEVKM is verified and validated by comparisons with previous numerical simulations and experimental measurements of a negative hydrogen ion source in the low-pressure (20-100 mtorr), low-absorbed-power-density (0.053-0.32 W/cm3) regime and of a microwave plasma reactor in the intermediate to high-pressure (1-100 torr), high-absorbed-power-density (8.26-22 W/cm3) regime. The GEVKM is applied to the simulation of a high-current negative hydrogen ion source (HCNHIS). The HCNHIS consists of a high-pressure (20-65 torr) radio-frequency discharge chamber in which the main production of high-lying vibrational states of the hydrogen molecules occurs, a bypass system, and a low-pressure (0.1-0.4 torr) negative hydrogen ion production region where negative ions are generated by the dissociative attachment of low-energy electrons to rovibrationally excited hydrogen molecules. The discharge pressure and negative hydrogen ion current predicted by the GEVKM compare well with the measurements in the HCNHIS.
Keywords :
dissociation; electron attachment; excited states; ground states; heat transfer; high-frequency discharges; hydrogen ions; ion sources; ionisation; plasma chemistry; plasma kinetic theory; plasma simulation; plasma sources; plasma transport processes; plasma-wall interactions; rotational-vibrational states; surface chemistry; vibrational states; H; bypass system; chamber walls; discharge pressure; dissociative attachment; electron energy equation; electronically excited hydrogen atoms; global enhanced vibrational kinetic model; ground-state hydrogen atoms; ground-state hydrogen molecules; ground-state negative ions; ground-state positive ions; heat transfer equation; high-current negative hydrogen ion source simulation; high-lying vibrational states; high-pressure high-absorbed-power-density regime; high-pressure hydrogen RF discharges; high-pressure radiofrequency discharge chamber; high-pressure regime; inductively coupled cylindrical discharges; ionization kinetics; low-energy electrons; low-pressure low-absorbed-power-density regime; low-pressure negative hydrogen ion production region; low-pressure regime; microwave plasma reactor; multitemperature chemically reacting hydrogen plasmas; negative hydrogen ion current; plasma species; pressure 1 torr to 100 torr; pressure 20 mtorr to 0.4 torr; rovibrationally excited hydrogen molecules; surface chemical process; total energy equation; volume-averaged steady-state continuity equations; volumetric chemical process; Discharges (electric); Hydrogen; Ion sources; Mathematical model; Plasma temperature; Gas discharge devices; ion sources; plasma chemistry; plasma simulation; plasma simulation.;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2015.2429313