DocumentCode :
720348
Title :
Enhancement mode gallium nitride transistor reliability
Author :
Lidow, Alex ; Strittmatter, Rob
Author_Institution :
Efficient Power Conversion Corp., El Segundo, CA, USA
fYear :
2015
fDate :
7-10 June 2015
Firstpage :
269
Lastpage :
273
Abstract :
In this paper, we provide new reliability data on commercially available enhancement mode GaN transistors under a wide variety of stress conditions. The first section reports data on long-term, large sample size qualification testing under high temperature reverse bias (HTRB) and high temperature gate bias (HTGB). Environmental reliability data is also shown, including temperature cycling and humidity. The second section provides failure rate predictions using acceleration factors derived by stressing devices outside of normal gate and drain voltage stress conditions. In the last section, we explore the reliability advantages of wafer level chipscale (WLCS) packaging compared to conventional MOSFET packages.
Keywords :
III-V semiconductors; field effect transistors; gallium compounds; humidity; semiconductor device reliability; wafer level packaging; wide band gap semiconductors; GaN; HTGB; HTRB; WLCS packaging; acceleration factor; enhancement mode gallium nitride transistor reliability; environmental reliability; failure rate prediction; high temperature gate bias; high temperature reverse bias; humidity; temperature cycling; wafer level chipscale packaging; Field effect transistors; Gallium nitride; Integrated circuit reliability; Logic gates; Stress; GaN; HTGB; HTRB; Reliability; eGaN FETs; failure rate prediction; packaging;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
DC Microgrids (ICDCM), 2015 IEEE First International Conference on
Conference_Location :
Atlanta, GA
Type :
conf
DOI :
10.1109/ICDCM.2015.7152052
Filename :
7152052
Link To Document :
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