Title :
Ant colony algorithm for layout decomposition in double/multiple patterning lithography
Author :
Xianhua Ke ; Wen, L.V. ; Shiyuan Liu
Author_Institution :
State Key Lab. of Digital Manuf. Equip. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
Double or multiple patterning (DP/MP) lithography is an alternative for the sub-20 nm node and beyond. In MP, it is essential to solve a minimal patterning number to decompose the dense features. While in DP, it is required to remove odd conflict cycles with minimal stitch number. In this work, we apply an ant colony algorithm to address these two issues, respectively.
Keywords :
ant colony optimisation; lithography; ant colony algorithm; double patterning lithography; layout decomposition; minimal patterning number; multiple patterning lithography;
Conference_Titel :
Semiconductor Technology International Conference (CSTIC), 2015 China
Conference_Location :
Shanghai
DOI :
10.1109/CSTIC.2015.7153361
