• DocumentCode
    720774
  • Title

    A new method to calculate intensity distribution in source mask optimization

  • Author

    Yehua Zuo ; Jinyu Zhang

  • Author_Institution
    Inst. of Microelectron., Tsinghua Univ., Beijing, China
  • fYear
    2015
  • fDate
    15-16 March 2015
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    We proposed a new method to perform intensity calculation for the Abbe´s image model. The method is similar to the decomposition of the transmission cross coefficients (TCC) of the optics system using sum of coherent systems decomposition (SOCS) by SVD. The singular values and kernels are derived efficiently for a pixel-based source. The intensity calculation can be expressed using sum of convolutions between mask and a few kernels and then largely reduce a large amount of convolution computations in the Abbe´s image model. This method can be used in the source and mask optimization (SMO) to increase computational efficiency.
  • Keywords
    convolution; masks; optimisation; singular value decomposition; Abbe image model; SOCS; SVD; TCC; convolution computations; intensity distribution; optics system; pixel-based source; singular kernels; singular value decomposition; singular values; source mask optimization; sum of coherent systems decomposition; transmission cross coefficients; Computational modeling; Eigenvalues and eigenfunctions; Kernel; Matrix decomposition; Optical imaging; Optics; Optimization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Technology International Conference (CSTIC), 2015 China
  • Conference_Location
    Shanghai
  • ISSN
    2158-2297
  • Type

    conf

  • DOI
    10.1109/CSTIC.2015.7153364
  • Filename
    7153364