DocumentCode :
720774
Title :
A new method to calculate intensity distribution in source mask optimization
Author :
Yehua Zuo ; Jinyu Zhang
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear :
2015
fDate :
15-16 March 2015
Firstpage :
1
Lastpage :
3
Abstract :
We proposed a new method to perform intensity calculation for the Abbe´s image model. The method is similar to the decomposition of the transmission cross coefficients (TCC) of the optics system using sum of coherent systems decomposition (SOCS) by SVD. The singular values and kernels are derived efficiently for a pixel-based source. The intensity calculation can be expressed using sum of convolutions between mask and a few kernels and then largely reduce a large amount of convolution computations in the Abbe´s image model. This method can be used in the source and mask optimization (SMO) to increase computational efficiency.
Keywords :
convolution; masks; optimisation; singular value decomposition; Abbe image model; SOCS; SVD; TCC; convolution computations; intensity distribution; optics system; pixel-based source; singular kernels; singular value decomposition; singular values; source mask optimization; sum of coherent systems decomposition; transmission cross coefficients; Computational modeling; Eigenvalues and eigenfunctions; Kernel; Matrix decomposition; Optical imaging; Optics; Optimization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Technology International Conference (CSTIC), 2015 China
Conference_Location :
Shanghai
ISSN :
2158-2297
Type :
conf
DOI :
10.1109/CSTIC.2015.7153364
Filename :
7153364
Link To Document :
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