DocumentCode
720774
Title
A new method to calculate intensity distribution in source mask optimization
Author
Yehua Zuo ; Jinyu Zhang
Author_Institution
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear
2015
fDate
15-16 March 2015
Firstpage
1
Lastpage
3
Abstract
We proposed a new method to perform intensity calculation for the Abbe´s image model. The method is similar to the decomposition of the transmission cross coefficients (TCC) of the optics system using sum of coherent systems decomposition (SOCS) by SVD. The singular values and kernels are derived efficiently for a pixel-based source. The intensity calculation can be expressed using sum of convolutions between mask and a few kernels and then largely reduce a large amount of convolution computations in the Abbe´s image model. This method can be used in the source and mask optimization (SMO) to increase computational efficiency.
Keywords
convolution; masks; optimisation; singular value decomposition; Abbe image model; SOCS; SVD; TCC; convolution computations; intensity distribution; optics system; pixel-based source; singular kernels; singular value decomposition; singular values; source mask optimization; sum of coherent systems decomposition; transmission cross coefficients; Computational modeling; Eigenvalues and eigenfunctions; Kernel; Matrix decomposition; Optical imaging; Optics; Optimization;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Technology International Conference (CSTIC), 2015 China
Conference_Location
Shanghai
ISSN
2158-2297
Type
conf
DOI
10.1109/CSTIC.2015.7153364
Filename
7153364
Link To Document