Title :
PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications
Author :
Sarrazin, Aurelien ; Pimenta-Barros, Patricia ; Posseme, Nicolas ; Barnola, Sebastien ; Gharbi, Ahmed ; Argoud, Maxime ; Tiron, Raluca ; Cardinaud, Christophe
Author_Institution :
LETI, CEA, Grenoble, France
Abstract :
Directed Self-Assembly (DSA) of Block Copolymers (BCP) is one of the most promising alternative lithography techniques for sub-10 nm nodes. In this paper, we propose to study PMMA removal selectively to PS by plasma etching. This challenge requires a good selectivity between both polymers. Our best chemistries developed on blanket wafers have been tested on cylindrical and lamellar patterned wafers.
Keywords :
lithography; polymer blends; self-assembly; semiconductor technology; sputter etching; BCP; PMMA removal selectivity; PS; blanket wafer; block copolymer; directed self-assembly; dry etch approach; lamellar patterned wafer; lithography technique; plasma etching; poly(methyl methacrylate); polystyrene; Xenon;
Conference_Titel :
Semiconductor Technology International Conference (CSTIC), 2015 China
Conference_Location :
Shanghai
DOI :
10.1109/CSTIC.2015.7153384
