• DocumentCode
    720836
  • Title

    Design based inspection methodology and application in the fab

  • Author

    Jinghua Ke ; Shopen, Ofer ; Fei Li ; Wensheng Li ; Chang, Mike

  • Author_Institution
    Appl. Mater. Inc., Shanghai, China
  • fYear
    2015
  • fDate
    15-16 March 2015
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    As the design rule shrinks, detecting smaller key defects of interest is becoming more challenging for wafer inspection tools. A novel Knight™ Design Based Inspection (KDBI™) system was implemented to extend Applied Materials´ inspection tools´ capability. Using design data, the KDBI™ Recipe Editor helps to expedite the recipe creation process. A CAD database makes it easy to find the array areas automatically. Other region-of-interest (ROI) CAD information can be provided for KDBI™ to convert into inspection tool recipes with different detection sensitivity controls on different ROIs. Most of the die layout process during recipe setup is done off-line, saving in-line inspection tool time.
  • Keywords
    inspection; semiconductor technology; Knight™ Design Based Inspection system; applied materials inspection tools; detection sensitivity controls; die layout process; in-line inspection tool; inspection methodology; wafer inspection tools; Design automation; Image edge detection; Inspection; Irrigation; Layout; Lighting;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Technology International Conference (CSTIC), 2015 China
  • Conference_Location
    Shanghai
  • ISSN
    2158-2297
  • Type

    conf

  • DOI
    10.1109/CSTIC.2015.7153447
  • Filename
    7153447