DocumentCode :
720836
Title :
Design based inspection methodology and application in the fab
Author :
Jinghua Ke ; Shopen, Ofer ; Fei Li ; Wensheng Li ; Chang, Mike
Author_Institution :
Appl. Mater. Inc., Shanghai, China
fYear :
2015
fDate :
15-16 March 2015
Firstpage :
1
Lastpage :
3
Abstract :
As the design rule shrinks, detecting smaller key defects of interest is becoming more challenging for wafer inspection tools. A novel Knight™ Design Based Inspection (KDBI™) system was implemented to extend Applied Materials´ inspection tools´ capability. Using design data, the KDBI™ Recipe Editor helps to expedite the recipe creation process. A CAD database makes it easy to find the array areas automatically. Other region-of-interest (ROI) CAD information can be provided for KDBI™ to convert into inspection tool recipes with different detection sensitivity controls on different ROIs. Most of the die layout process during recipe setup is done off-line, saving in-line inspection tool time.
Keywords :
inspection; semiconductor technology; Knight™ Design Based Inspection system; applied materials inspection tools; detection sensitivity controls; die layout process; in-line inspection tool; inspection methodology; wafer inspection tools; Design automation; Image edge detection; Inspection; Irrigation; Layout; Lighting;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Technology International Conference (CSTIC), 2015 China
Conference_Location :
Shanghai
ISSN :
2158-2297
Type :
conf
DOI :
10.1109/CSTIC.2015.7153447
Filename :
7153447
Link To Document :
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