• DocumentCode
    721918
  • Title

    The effect of spin pumping in epitaxial Bi2Se3 films

  • Author

    Chiang, T. ; Lee, J. ; Tai, P. ; Wang, Z. ; Yi, T. ; Lee, S. ; Huang, J.

  • Author_Institution
    Dept. of Phys., Nat. Cheng Kung Univ., Tainan, Taiwan
  • fYear
    2015
  • fDate
    11-15 May 2015
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Bi2Se3 is one of the promising topological insulator (TI) materials, which have both helical spin polarization and strong spin-orbit coupling (SOC). In this work, high quality Bi2Se3 thin films were grown on c-plane sapphire (Al2O3) substrates by molecular beam epitaxy (MBE). The central part of the Bi2Se3 layer was covered with a permalloy (Ni80Fe20) layer by ion-beam sputtering (IBS) with a shadow mask. The inverse spin Hall effect (ISHE) of Bi2Se3/Py bilayers have been observed by spin pumping method at room temperature (RT). The magnitude of the electric voltage is proportional to the microwave excitation power and the direction of voltage is reversed when the direction of external magnetic field is reversed, proving that the voltage is due to ISHE induced by the spin pumping. Moreover, when the thickness of Bi2Se3 is equal to 8nm, the ISHE voltage has the maximum, evaluating the spin-diffusion length of Bi2Se3 is about 8nm.
  • Keywords
    Permalloy; bismuth compounds; epitaxial layers; molecular beam epitaxial growth; spin Hall effect; spin polarised transport; spin-orbit interactions; topological insulators; Al2O3; Bi2Se3-Ni80Fe20; MBE; c-plane sapphire substrates; electric voltage; epitaxial Bi2Se3 films; external magnetic field direction; helical spin polarization; inverse spin Hall effect; ion-beam sputtering; microwave excitation power; molecular beam epitaxy; permalloy layer; shadow mask; spin pumping effect; spin-orbit coupling; temperature 293 K to 298 K; topological insulator materials; Cities and towns; Magnetic fields; Microwave frequencies; Microwave theory and techniques; Molecular beam epitaxial growth; Physics; Topological insulators;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference (INTERMAG), 2015 IEEE
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4799-7321-7
  • Type

    conf

  • DOI
    10.1109/INTMAG.2015.7157177
  • Filename
    7157177