Magnetization reversal process study in exchange coupled synthetic antiferromagnetic multilayers and patterned structures

In this paper, FeCo/Ru/FeCo synthetic antiferromagnetic multilayers and patterned structures are fabricated to study magnetization reversal process using magnetic force microscopy (MFM). The multilayers are prepared on SiO₂ substrate via DC magnetron sputtering while the patterned structures are fabricated by electron beam lithography. VSM and MFM are used to measure magnetic properties and domain structures, respectively. Results show that the exchange coupling field increases and the squareness of the easy-axis hysteresis loop becomes better as the sputtering power increases.