Title :
Tradeoff of write-ability and erase-ability in overwrite
Author :
Lin, E.E. ; Bai, D. ; Liu, F. ; Yuan, S.
Author_Institution :
Western Digital, Fremont, CA, USA
Abstract :
This study analyzes the impact of system´s write-ability and erase-ability on OVW. It characterizes OVW by breaking down writing and erasing processes and varying write stress, data patterns, and writer designs. Some generic OVW trends are characterized. It is also found that the impact of writer design on OVW can be emulated by changing writing stress.
Keywords :
magnetic recording; data patterns; erase-ability; erasing process; generic overwrite trends; write-ability; writer designs; writing stress; Magnetic heads; Magnetic recording; Market research; Signal to noise ratio; Stress; Writing;
Conference_Titel :
Magnetics Conference (INTERMAG), 2015 IEEE
Conference_Location :
Beijing
Print_ISBN :
978-1-4799-7321-7
DOI :
10.1109/INTMAG.2015.7157464
