Diffusion behaviors observed on the surface of CoFeB film after the natural oxidation and the annealing

Author

Sato, S. ; Honjo, H. ; Ikeda, S. ; Ohno, H. ; Endoh, T. ; Niwa, M.

Author_Institution

Center for Innovative Integrated Electron. Syst., Tohoku Univ., Sendai, Japan

fYear

2015

fDate

11-15 May 2015

Firstpage

1

Lastpage

1

Abstract

This experiment investigates the reduction reaction of oxidized Fe/Co by B on the naturally oxidized surface of the CoFeB film after annealing. The focus is on the diffusion behaviors of the constituent elements at the film surface after natural oxidation and annealing to elucidate the oxidation and reduction mechanisms of the film. Surface sputtering and X-ray photoelectron spectroscopy are performed for depth profile analysis. The diffusion behaviors during the natural oxidation of the CoFeB film is speculated to be related to the amount of the standard free energy of the formation of oxides.

Keywords

X-ray photoelectron spectra; annealing; boron alloys; cobalt alloys; free energy; iron alloys; metallic thin films; oxidation; reaction kinetics; reduction (chemical); sputtering; surface diffusion; surface energy; CoFeB; X-ray photoelectron spectroscopy; annealing; natural oxidation; oxide formation; reduction reaction; standard free energy; surface diffusion; surface sputtering; Annealing; Films; Iron; Junctions; Magnetic anisotropy; Magnetic tunneling; Oxidation;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference (INTERMAG), 2015 IEEE

Conference_Location

Beijing

Print_ISBN

978-1-4799-7321-7

Type

conf

DOI

10.1109/INTMAG.2015.7157496

Filename

7157496