• DocumentCode
    722274
  • Title

    Perpendicular magnetic anisotropy in Ta/Pd (0–10 nm)/Co2FeAl0.5Si0.5/MgO/Ta structured films

  • Author

    Fu, H. ; You, C. ; Zhang, X. ; Tian, N.

  • Author_Institution
    Sch. of Mater. Sci. Eng., Xi´an Univ. of Technol., Xian, China
  • fYear
    2015
  • fDate
    11-15 May 2015
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    In this work, the film stacks of Ta (8 nm)/Pd (t=0-10 nm)/Co2FeAl0.5Si0.5 (3.2 nm)/MgO (2 nm)/Ta (6 nm) (hereinafter refer to Ta/Pd (t)/CFAS/MgO/Ta) were fabricated on the Si substrate by magnetron sputtering system under a base pressure better than 3×10-5 Pa at room temperature. The influence of the thickness of inserting Pd layer on the PMA was investigated in detail.
  • Keywords
    aluminium alloys; cobalt alloys; iron alloys; magnesium compounds; magnetic multilayers; magnetic thin films; palladium; perpendicular magnetic anisotropy; silicon alloys; sputter deposition; tantalum; Pd layer thickness; Si; Si substrate; Ta-Pd-Co2FeAl0.5Si0.5-MgO-Ta; film stacks; magnetron sputtering system; perpendicular magnetic anisotropy; size 0 nm to 10 nm; temperature 293 K to 298 K; Annealing; Critical current density (superconductivity); Films; Perpendicular magnetic anisotropy; Saturation magnetization; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference (INTERMAG), 2015 IEEE
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4799-7321-7
  • Type

    conf

  • DOI
    10.1109/INTMAG.2015.7157632
  • Filename
    7157632
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=722274